High-k Gate Dielectrics for CMOS Technology.pdf

High-k Gate Dielectrics for CMOS Technology PDF

A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological
viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these
materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies.

Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections
with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.

Part One Scaling and Challenge of Si-based CMOS High-k Gate Dielectrics for CMOS Technology, First Edition. Edited by Gang He and Zhaoqi Sun. 2012 Wiley-VCH Verlag GmbH & Co. KGaA. Published 2012 by Wiley-VCH Verlag GmbH & Co. KGaA.

2.79 MB DATEIGRÖSSE
9783527646371 ISBN
Englisch SPRACHE
High-k Gate Dielectrics for CMOS Technology.pdf

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